PRODUCT DATA SHEET
S-NRD
High
purity, high performance developer specifically designed for negative resist
development. S-NRD is a non-acetic,
high boiling, low volatility, non aromatic containing product which has no
residues thereby eliminating wafer surface contamination. S-NRD is a distilled and specially
formulated product which generates the highest performance in developing
negative resists. Resolution and edge
acuity in developed resist images are substantially improved when utilizing
S-NRD than normally found using other negative resist developers.
Exposed
photoresist coatings can be developed using spray or immersion
development. Spray development is best
employed for fine image development.
For immersion development agitation of the S-NRD solution is
recommended. The process latitude
employing S-NRD is very wide for resolution in the general order of 2.5 micron
lines. In 0.8 micron resist coating the
following conditions are recommended:
Spray development 30 sec.
Immersion development (with
agitation) 20 sec.
It
is recommended that the development step utilizing S-NRD be followed by
treatment with a resist rinse. Optimum
resist rinse time is 20 sec. For both spray immersion.
SILICON RESOURCES, INC.
211 E. Chilton Drive
Chandler, AZ 85225
Tel: 480-503-4564 Fax: 480-503-4628
www.siliconresources.com