| Silylation Agents for Surface Imaged
Resist Applications |
| Alternatives to Hexamethyldisilazane
(HMDS) for silylation of surface imaged resists have gained increased
interest. These alternatives, in ascending order of reactivity include
TMSDEA, TMSDMA, TMDS, DMSDEA, and DMSDMA. These materials are more
reactive with organic resist compositions than HMDS and offer unique
advantages including faster reaction and reduced swelling. Data Sheets
detailing chemical characteristics are available from SiR. |
| MA-145 |
TMSDEA |
Trimethylsilyldiethylamine |
| MA-117 |
TMSDMA |
N,N-Dimethylaminotrimethylsilane |
| MA-133 |
TMDS |
1,1,3,3-Tetramethyldisilazane |
| MA-131 |
DMSDEA |
Dimethylsilyldiethylamine |
| MA-103 |
DMSDMA |
Dimethylsilyldimethylamine |
| Polyfunctional Silylation
Agents |
| PA-219 |
HMCTS |
Hexamethylcyclotrisilazane |
| PA-146 |
BDADS |
Bis(N,N-Dimethylamino)dimethylsilane |
| PA-132 |
BDAMS |
Bis(N,N-Dimethylamino)methylsilane |
|
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